Mr. Teramoto will be presenting USHIO’s latest development progress at the International Symposium on Extreme Ultraviolet Lithography (EUVL).

The first generation of EUVL production tools has been released, and chip manufacturers and the supply chain are focused on driving EUVL Technology toward meeting HVM productivity and yield targets for the 7 nm technology logic node, unless memory companies accelerate their EUV introduction. Read more:

When: the 5th of October

Where: MECC, Forum 100, Maastricht, GV 6229, The Netherlands